Electron Beam Lithography (EBL) Tool

Lund University, Department of Physics, Lund Nano Lab is acquiring an Electron Beam Lithography Tool. The instrument is intended for high resolution, repeatable patterning, equipped with a large writing field for high throughput patterning, and automated self-calibration routines to support long exposures with minimal errors due to beam drift. Finally, its flexible sample loading system must be configured for a wide range of samples from small pieces used for basic science, or wafers up to 8" in diameter for pilot production testing. With these properties, the Electron Beam Lithography Tool will become a central part of the Lund Nano Lab fabrication infrastructure and support a range of applications such as quantum devices, high-power electronics, metasurfaces and more. In addition to ...